Gas Introduction
Ethylsilane is an inorganic compound with the chemical formula Si2H6. It is a colorless, transparent, and toxic gas with an unpleasant and irritating odor at room temperature and pressure. It has chemical properties similar to silane, but its reactivity is stronger than silane. It is more unstable than silane and slowly decomposes into silane and hydrogen at room temperature. Decompose into SiH4, SinHm, H2 at 300-500 ℃, and also decompose under light. Mainly used in solar cells, photosensitive rotary tubes, amorphous silicon films, epitaxial growth, oxide films, nitride films, chemical vapor deposition, and other aspects.
Basic properties
Ethylsilane is a colorless transparent liquid that spontaneously ignites in air, with an ignition point below room temperature. When it encounters air, it immediately burns and decomposes into SiH4 and H2. The combustion concentration range is wide, and when the concentration is above 0.2%, a flame is emitted during combustion; When the concentration is below 0.2%, oxidation reaction is carried out to generate white SiO2. Explosive combustion in chlorine gas. React explosively with halogen gases, but if at low temperatures, perform halogenation moderately. If in contact with SF6, it will explode. Intense reaction with carbon tetrachloride and chloroform. React and decompose with alkali metals and mercury alloys to produce silane and hydrogen. React with caustic potassium to free H2. It does not react with pure water and acid, but reacts with alkali to produce silicates and hydrogen. Even the presence of trace amounts of alkali dissolved from glass can cause hydrolysis of ethane. In the presence of KH or LiCl impurities, it slowly decomposes at room temperature.
Si2H6- → SiH4+(SiH2) x
Ethylsilane is soluble in carbon disulfide, ethyl alcohol, benzene, and ethyl silicic acid. It corrodes rubber, butter, lubricants, lead, etc., but does not corrode most metals.
Main uses
1. Used in solar cells, photosensitive rotary tubes, amorphous silicon films, epitaxial growth, oxide films, nitride films, chemical vapor deposition, and other fields. In the production of solar cells, the deposition rate of ethylene silane on amorphous silicon wafers is much faster than that of silane, and the temperature can be reduced by 200-300 ℃. In ion implantation, the use of ethane as an ion source is more likely to glow and has a stronger beam current, resulting in significantly better results than using other gases as ion sources.
2. In semiconductor technology, it is used for epitaxial and diffusion processes, as well as for photosensitive drums used in solar cells and electronic photography.
